THIN-FILM DC SQUID WITH LOW NOISE AND DRIFT

被引：12

作者：

CLARKE, J

GOUBAU, WM

KETCHEN, MB

机构：

[1] UNIV CALIF,DEPT PHYS,BERKELEY,CA 94720

[2] LAWRENCE BERKELEY LAB,INORG MAT RES DIV,BERKELEY,CA 94720

来源：

APPLIED PHYSICS LETTERS | 1975年 / 27卷 / 03期

关键词：

D O I：

10.1063/1.88391

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：155 / 156

页数：2

共 9 条

[1] PREPARATION OF JOSEPHSON JUNCTIONS BY PLASMA OXIDATION OF NB [J].

GRAEFFE, R ;

WIIK, T .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (05) :2146-&

[2] NEW METHOD FOR FABRICATING NIOBIUM OXIDE BARRIER JOSEPHSON JUNCTIONS [J].

HANSMA, PK .

JOURNAL OF APPLIED PHYSICS, 1974, 45 (03) :1472-1473

[3]

LIKHAREV KK, 1972, JETP LETT-USSR, V15, P442

[4] EFFECT OF AC IMPEDANCE ON DC VOLTAGE-CURRENT CHARACTERISTICS OF SUPERCONDUCTOR WEAK-LINK JUNCTIONS [J].

MCCUMBER, DE .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (07) :3113-&

[5] FABRICATION OF TUNNEL JUNCTIONS ON NIOBIUM FILMS [J].

MULLEN, LO ;

SULLIVAN, DB .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (05) :2115-&

[6] THIN-FILM JOSEPHSON JUNCTIONS USING GETTER-SPUTTERED NIOBIUM [J].

NORDMAN, JE .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (05) :2111-&

[7] DC AND AC JOSEPHSON EFFECT IN SPUTTERED NB-NBOX-PB JUNCTIONS [J].

SCHWIDTAL, K .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (01) :202-+

[8] CURRENT-VOLTAGE CHARACTERISTICS OF JOSEPHSON JUNCTIONS [J].

STEWART, WC .

APPLIED PHYSICS LETTERS, 1968, 12 (08) :277-&

[9]

1975, IEEE T MAGN, V11, P724

← 1 →