GAS-PHASE SILICON ATOMS IN SILANE CHEMICAL VAPOR-DEPOSITION - LASER-EXCITED FLUORESCENCE MEASUREMENTS AND COMPARISONS WITH MODEL PREDICTIONS

被引：58
作者：
BREILAND, WG
HO, P
COLTRIN, ME
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 04期
关键词：
D O I：
10.1063/1.337280
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1505 / 1513
页数：9
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