GAS-PHASE SILICON ATOMS IN SILANE CHEMICAL VAPOR-DEPOSITION - LASER-EXCITED FLUORESCENCE MEASUREMENTS AND COMPARISONS WITH MODEL PREDICTIONS

被引：58

作者：

BREILAND, WG

HO, P

COLTRIN, ME

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 04期

关键词：

D O I：

10.1063/1.337280

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1505 / 1513

页数：9

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