DISLOCATION PROPAGATION AND EMITTER EDGE DEFECTS IN SILICON WAFERS

被引：40

作者：

HU, SM ^{[1
]}

KLEPNER, SP ^{[1
]}

SCHWENKER, RO ^{[1
]}

SETO, DK ^{[1
]}

机构：

[1] IBM CORP,DIV SYST PROD,E FISHKILL,NY 12533

来源：

JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 09期

关键词：

D O I：

10.1063/1.323269

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4098 / 4106

页数：9

共 10 条

[1] DIFFUSION PIPES IN SILICON NPN STRUCTURES [J].

BARSON, F ;

HESS, MS ;

ROY, MM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (02) :304-&

[2]

BARSON F, 1975, ELECTROCHEM SOC M TO

[3] TEMPERATURE DISTRIBUTION AND STRESSES IN CIRCULAR WAFERS IN A ROW DURING RADIATIVE COOLING [J].

HU, SM .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (11) :4413-+

[4] INDENTATION DISLOCATION ROSETTES IN SILICON [J].

HU, SM .

JOURNAL OF APPLIED PHYSICS, 1975, 46 (04) :1470-1472

[5] DISLOCATIONS IN THERMALLY STRESSED SILICON WAFERS [J].

HU, SM .

APPLIED PHYSICS LETTERS, 1973, 22 (05) :261-264

[6]

HU SM, 1975, J APPL PHYS, V46, P1465, DOI 10.1063/1.321796

[7]

MOREZANE K, 1969, J APPL PHYS, V40, P4104

[8] INFLUENCE OF DISLOCATIONS ON PROPERTIES OF SHALLOW DIFFUSED TRANSISTORS [J].

PLANTINGA, GH .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (04) :394-+

[9]

POPONIAK MR, 1973, SEMICONDUCTOR SILICO, P701

[10]

SETO DK, 1973, SEMICONDUCTOR SILICO, P651

← 1 →