PROPERTIES OF MOLYBDENUM SILICIDE FILM DEPOSITED BY CHEMICAL VAPOR-DEPOSITION

被引：37

作者：

INOUE, S

TOYOKURA, N

NAKAMURA, T

MAEDA, M

TAKAGI, M

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 07期

关键词：

D O I：

10.1149/1.2120042

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1603 / 1607

页数：5

共 10 条

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