CHEMICALLY VAPOR-DEPOSITED TI3SIC2

被引：281
|
作者：
GOTO, T
HIRAI, T
机构：
来源：
MATERIALS RESEARCH BULLETIN | 1987年 / 22卷 / 09期
关键词：
D O I：
10.1016/0025-5408(87)90128-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：1195 / 1201
页数：7
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