OPTICAL-PROPERTIES OF EXTREMELY HEAVILY DOPED SI OBTAINED BY ION-IMPLANTATION AND LASER ANNEALING

被引：0
作者：
MOTOOKA, T [1 ]
MIYAO, M [1 ]
TOKUYAMA, T [1 ]
机构：
[1] HITACHI LTD, CENT RES LAB, KOKUBUNJI, TOKYO 185, JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C103 / C103
页数：1
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