INFLUENCE OF SUBSTRATE-TEMPERATURE AND PLASMA POWER-DENSITY ON THE PROPERTIES OF PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITED TITANIUM NITRIDE

被引：6

作者：

CRUMMENAUER, J ^{[1
]}

STOCK, HR ^{[1
]}

MAYR, P ^{[1
]}

机构：

[1] STIFTUNG INST WERKSTOFFTECH,D-28359 BREMEN,GERMANY

来源：

MATERIALS AND MANUFACTURING PROCESSES | 1995年 / 10卷 / 06期

关键词：

D O I：

10.1080/10426919508935107

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium nitride films deposited onto high speed steel substrates by plasma-assisted chemical vapor deposition (PACVD) from TiCl4, H-2, N-2, and Ar gas mixtures have been investigated. The substrate temperature was varied between 250 and 550 degrees C via the plasma power density or via an additional electrical heater. The influence of temperature and plasma power density on the morphology, chemical composition, hardness and adhesion of the coatings was studied. At 2 temperature of 500 degrees C different plasma power densities caused changes of the morphology of the coatings. At low plasma power densities fine grained polycrystalline layers were observed. A significant change from coarse to fine grained structures was also observed with decreasing deposition temperature Scratch test results indicate that coatings deposited at a given substrate temperature with lower plasma power density showed increased values of the critical load.

引用

页码：1267 / 1276

页数：10

共 19 条

[1] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIN AND TIC ON STEEL - PROPERTIES OF COATINGS [J].