ELECTRON-BEAM LITHOGRAPHY OF CURVED STRUCTURES WITH AN ENHANCED VECTOR-SCAN PATTERN GENERATOR SUPPORTING CONIC-BASED PRIMITIVES

被引：7

作者：

VASEY, F ^{[1
]}

PRONGUE, D ^{[1
]}

ROTHUIZEN, H ^{[1
]}

VETTIGER, P ^{[1
]}

机构：

[1] IBM CORP,DIV RES,ZURICH RES LAB,CH-8803 RUSCHLIKON,SWITZERLAND

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587532

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3460 / 3464

页数：5

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