AR+ LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF SI FROM SIH4

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作者：
BAUERLE, D
IRSIGLER, P
LEYENDECKER, G
NOLL, H
WAGNER, D
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来源：
APPLIED PHYSICS LETTERS | 1982年 / 40卷 / 09期
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O59 [应用物理学];
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页码：819 / 821
页数：3
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