CHEMICAL-DEPOSITION OF CU2O THIN-FILMS

被引：131

作者：

RISTOV, M ^{[1
]}

SINADINOVSKI, G ^{[1
]}

GROZDANOV, I ^{[1
]}

机构：

[1] UNIV KIRIL METODIJ, FAC CHEM, Skopje, YUGOSLAVIA

来源：

THIN SOLID FILMS | 1985年 / 123卷 / 01期

关键词：

CHEMICAL REACTIONS - OPTICAL PROPERTIES - SEMICONDUCTING FILMS;

D O I：

10.1016/0040-6090(85)90041-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A simple method for the chemical deposition of Cu//2O thin films is described. The films obtained by this method are of high chemical purity and their thicknesses can easily be controlled during the deposition process. The physical properties of the films were examined and compared with the properties of Cu//2O obtained by other methods.

引用

页码：63 / 67

页数：5

共 11 条

[1] EFFECT OF THE OXYGEN-PRESSURE DURING SPUTTERING ON THE PROPERTIES OF THIN CUOX FILMS [J].