THE ROLE OF GALLIUM ANTISITE DEFECT IN ACTIVATION AND TYPE-CONVERSION IN SI IMPLANTED GAAS

被引:22
作者
HIRAMOTO, T
MOCHIZUKI, Y
SAITO, T
IKOMA, T
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1985年 / 24卷 / 12期
关键词
D O I
10.1143/JJAP.24.L921
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:L921 / L924
页数:4
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共 26 条
[1]   RADIATION ANNEALING OF GAAS IMPLANTED WITH SI [J].
ARAI, M ;
NISHIYAMA, K ;
WATANABE, N .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (02) :L124-L126
[2]   INCORPORATION AND CHARACTERIZATION OF ACCEPTORS IN EPITAXIAL GAAS [J].
ASHEN, DJ ;
DEAN, PJ ;
HURLE, DTJ ;
MULLIN, JB ;
WHITE, AM .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1975, 36 (10) :1041-1053
[3]   PHOTOLUMINESCENCE AND INFRARED-SPECTROSCOPY OF ACCEPTORS IN GAAS [J].
BISHOP, SG ;
SHANABROOK, BV ;
MOORE, WJ .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (06) :1785-1790
[4]   RADIATIVE LIFETIMES OF DONOR-ACCEPTOR PAIRS IN P-TYPE GALLIUM ARSENIDE [J].
DINGLE, R .
PHYSICAL REVIEW, 1969, 184 (03) :788-&
[5]   INFRARED-ABSORPTION OF THE 78-MEV ACCEPTOR IN GAAS [J].
ELLIOTT, KR ;
HOLMES, DE ;
CHEN, RT ;
KIRKPATRICK, CG .
APPLIED PHYSICS LETTERS, 1982, 40 (10) :898-901
[6]   INTERACTION BETWEEN BORON AND INTRINSIC DEFECTS IN GAAS [J].
ELLIOTT, KR .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (10) :3856-3858
[7]   RESIDUAL DOUBLE ACCEPTORS IN BULK GAAS [J].
ELLIOTT, KR .
APPLIED PHYSICS LETTERS, 1983, 42 (03) :274-276
[8]   RAPID THERMAL ANNEALING OF SI+ IMPLANTED GAAS IN THE PRESENCE OF ARSENIC PRESSURE BY GAAS POWDER [J].
HIRAMOTO, T ;
SAITO, T ;
IKOMA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1985, 24 (03) :L193-L195
[9]   CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE - ENCAPSULANT LAYERS FOR ANNEALING GALLIUM-ARSENIDE [J].
INADA, T ;
OHKUBO, T ;
SAWADA, S ;
HARA, T ;
NAKAJIMA, M .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (09) :1525-1529
[10]   ARSENIC VACANCY FORMATION IN GAAS ANNEALED IN HYDROGEN GAS-FLOW [J].
ITOH, T ;
TAKEUCHI, M .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (02) :227-232