STUDY OF THE BAND DISCONTINUITIES AT THE A-SIH/C-SI INTERFACE BY INTERNAL PHOTOEMISSION

被引:13
作者
CUNIOT, M
MARFAING, Y
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D O I
10.1016/0022-3093(85)90826-9
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:987 / 990
页数:4
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