INFLUENCE OF ACCUMULATION OF THE MINORITY-CARRIERS IN A P+-TYPE LAYER ON THE RECOVERY OF THE VOLTAGE ACROSS A P+-N JUNCTION

被引:0
作者
KARDOSYSOEV, AF
POPOVA, MV
SHEMETILO, DI
机构
来源
SOVIET PHYSICS SEMICONDUCTORS-USSR | 1992年 / 26卷 / 06期
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中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A study was made of the influence of accumulation of the minority carriers in a heavily doped p+-type layer of a p+-n-n+ diode on the process of recovery of the voltage across the diode when the direction of the current flowing through the diode was reversed. Experiments carried out on diodes with different gradients dn/dx of the dopant concentration in the p-n junction showed that the accumulation of carriers reduced significantly the rates of rise of the voltage across the diode during the stage when carriers were removed from it. A numerical calculation yielded results in good agreement with the experimental data when only one parameter (the injection efficiency of the p+-n junction) was varied. The value of this efficiency ranged from 1 to 0.26 for diodes with different values of dn/dx. In particular, when dn/dx was reduced from 8 X 10(8) to 1.2 X 10(8) cm -4, the injection efficiency decreased from 0.5 to 0.26.
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页码:587 / 590
页数:4
相关论文
共 4 条
  • [1] Brylevskii V. I., 1988, Soviet Physics - Technical Physics, V33, P1364
  • [2] BRYLEVSKII VI, 1990, P ALL UNION TOPICAL
  • [3] EFANOV VM, 1986, PRIB TEKH EKSP
  • [4] KARDOSYSOEV AF, 1991, SOV PHYS SEMICOND+, V25, P1