SILICON-NITRIDE DEPOSITION IN A VERTICAL FLOW REACTOR

被引：0

作者：

CAPRON, BA ^{[1
]}

HERRING, RB ^{[1
]}

机构：

[1] ANICON INC,SAN JOSE,CA 95134

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C319 / C319

页数：1

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