SILICON-NITRIDE DEPOSITION IN A VERTICAL FLOW REACTOR

被引：0
作者：
CAPRON, BA [1 ]
HERRING, RB [1 ]
机构：
[1] ANICON INC,SAN JOSE,CA 95134
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C319 / C319
页数：1
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