CURRENT-INDUCED HYDROGEN MIGRATION AND INTERFACE TRAP GENERATION IN ALUMINUM SILICON DIOXIDE SILICON CAPACITORS

被引：17
作者：
FEIGL, FJ
GALE, R
CHEW, H
MAGEE, CW
YOUNG, DR
机构：
[1] RCA CORP, SARNOFF RES CTR, PRINCETON, NJ 08540 USA
[2] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1984年 / 1卷 / 2-3期
关键词：
D O I：
10.1016/0168-583X(84)90091-0
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：348 / 354
页数：7
相关论文
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