DIFFUSION OF CARBON AND SULFUR IN PHOSPHORUS-DOPED SILICON

被引：0
作者：
GRUZIN, PL
ZEMSKII, SV
BULKIN, AD
MAKAROV, NM
机构：
[1] IP BARDIN FERROUS MET CENT RES INST,MOSCOW,USSR
[2] SARANSK ELECT RECTIFIER FACTORY,SARANSK,USSR
来源：
SOVIET PHYSICS SEMICONDUCTORS-USSR | 1974年 / 7卷 / 09期
关键词：
D O I：
暂无
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
引用
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页码：1241 / 1241
页数：1
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