THERMAL INPUT TO SUBSTRATE DURING DEPOSITION BY HOLLOW-CATHODE DISCHARGE

被引：21

作者：

KOMIYA, S ^{[1
]}

TSURUOKA, K ^{[1
]}

机构：

[1] ULVAC CORP,2500 HAGISONO,CHIGASAKI 253,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 01期

关键词：

D O I：

10.1116/1.568617

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：589 / 592

页数：4

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[9] STRUCTURE MODIFICATION BY ION-BOMBARDMENT DURING DEPOSITION [J].

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[10] HIGH RATE ION PRODUCTION FOR VACUUM DEPOSITION [J].

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