RESIDUAL-STRESS IN COATED LOW-Z FILMS OF TIC AND TIN .2. CORRELATION OF RESIDUAL-STRESS WITH MICROSTRUCTURE

被引：1
|
作者：
YOSHIZAWA, I [1 ]
KABEYA, Z [1 ]
KAMADA, K [1 ]
机构：
[1] NAGOYA UNIV,INST PLASMA PHYS,CHIKUSA KU,NAGOYA,AICHI 464,JAPAN
来源：
JOURNAL OF NUCLEAR MATERIALS | 1984年 / 123卷 / 1-3期
关键词：
D O I：
10.1016/0022-3115(84)90261-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：1315 / 1319
页数：5
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