CRYSTALLIZATION OF GE AND SI IN METAL-FILMS .1.

被引：89

作者：

OTTAVIAN.G ^{[1
]}

SIGURD, D ^{[1
]}

MARRELLO, V ^{[1
]}

MAYER, JW ^{[1
]}

MCCALDIN, JO ^{[1
]}

机构：

[1] CALTECH, PASADENA, CA 91109 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 04期

关键词：

D O I：

10.1063/1.1663483

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1730 / 1739

页数：10

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