INTERFACIAL REACTION AND SCHOTTKY-BARRIER BETWEEN PT AND GAAS

被引：76

作者：

FONTAINE, C ^{[1
]}

OKUMURA, T ^{[1
]}

TU, KN ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 03期

关键词：

D O I：

10.1063/1.332165

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1404 / 1412

页数：9

相关论文

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