THE IMPACT OF HIGH-SENSITIVITY RESIST MATERIALS ON X-RAY-LITHOGRAPHY

被引：11

|

作者：

SELIGSON, D ^{[1
]}

ITO, H ^{[1
]}

WILLSON, CG ^{[1
]}

机构：

[1] IBM CORP,ALMADEN RES CTR,DIV RES,SAN JOSE,CA 95120

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584068

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：2268 / 2273

页数：6

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