THE IMPACT OF HIGH-SENSITIVITY RESIST MATERIALS ON X-RAY-LITHOGRAPHY

被引：11
|
作者：
SELIGSON, D [1 ]
ITO, H [1 ]
WILLSON, CG [1 ]
机构：
[1] IBM CORP,ALMADEN RES CTR,DIV RES,SAN JOSE,CA 95120
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期
关键词：
D O I：
10.1116/1.584068
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：2268 / 2273
页数：6
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