THE IMPACT OF HIGH-SENSITIVITY RESIST MATERIALS ON X-RAY-LITHOGRAPHY

被引：11
|
作者：
SELIGSON, D [1 ]
ITO, H [1 ]
WILLSON, CG [1 ]
机构：
[1] IBM CORP,ALMADEN RES CTR,DIV RES,SAN JOSE,CA 95120
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期
关键词：
D O I：
10.1116/1.584068
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：2268 / 2273
页数：6
相关论文
共 50 条
  • [1] DRY-DEVELOPABLE HIGH-SENSITIVITY PLASMA POLYMERIZED RESIST FOR X-RAY-LITHOGRAPHY
    YAMADA, H
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1987, 193 : 100 - PMSE
  • [2] RESIST MATERIALS AND PROCESSES FOR X-RAY-LITHOGRAPHY
    SEEGER, D
    IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1993, 37 (03) : 435 - 448
  • [3] OPTIMIZATION OF RESIST MATERIALS FOR PROXIMITY X-RAY-LITHOGRAPHY
    NOVEMBRE, AE
    KNUREK, CS
    KOMETANI, JM
    KUMAR, U
    MIXON, DA
    ALONZO, JC
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1994, 208 : 510 - POLY
  • [4] POLYMETHACRYLONITRILE AS A RESIST IN X-RAY-LITHOGRAPHY
    SCHLEGEL, L
    SCHNABEL, W
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 82 - 86
  • [5] NEGATIVE RESIST PROFILES IN X-RAY-LITHOGRAPHY
    SUZUKI, Y
    YOSHIOKA, N
    YAMAZAKI, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (03): : 301 - 305
  • [6] High sensitivity nanocomposite resist materials for X-ray and EUV Lithography
    Ali, MA
    Gonsalves, KE
    Batina, N
    Golovkina, V
    Cerrina, F
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 1173 - 1180
  • [7] RESIST-SOURCE OPTIMIZATION FOR X-RAY-LITHOGRAPHY
    BLAIS, PD
    DIXON, GD
    OKEEFFE, TW
    OSTROSKI, J
    MEEK, TT
    PECKERAR, MC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : C374 - C374
  • [8] BEAMLINES FOR THIN AND THICK RESIST X-RAY-LITHOGRAPHY
    DAHLBACKA, GH
    PEARCE, J
    YOUNGER, F
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1992, 319 (1-3): : 359 - 365
  • [9] POLY(METHYL METHACRYLATE RESIST SENSITIVITY ENHANCEMENT IN X-RAY-LITHOGRAPHY BY INSITU POLYMERIZATION
    LIU, WT
    CORELLI, JC
    STECKL, AJ
    MOORE, JA
    SILVERMAN, J
    APPLIED PHYSICS LETTERS, 1984, 44 (10) : 973 - 975
  • [10] IDENTIFICATION OF SENSITIVE POSITIVE AND NEGATIVE WORKING RESIST MATERIALS FOR PROXIMITY X-RAY-LITHOGRAPHY
    NOVEMBRE, AE
    KOMETANI, JM
    KNUREK, CS
    KUMAR, U
    NEENAN, TX
    MIXON, DA
    NALAMASU, O
    MUNZEL, N
    MICROELECTRONIC ENGINEERING, 1995, 27 (1-4) : 389 - 392
12345