DIFFUSION OF ARSENIC IN BILAYER POLYCRYSTALLINE SILICON FILMS

被引：21

作者：

ARIENZO, M

KOMEM, Y

MICHEL, AE

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 02期

关键词：

D O I：

10.1063/1.333081

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：365 / 369

页数：5

共 14 条

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[9] GRAIN-BOUNDARY DIFFUSION OF ALUMINUM IN POLYCRYSTALLINE SILICON FILMS [J].

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