KINETICS OF REACTIVE SPUTTER DEPOSITION OF TITANIUM OXIDES

被引：20
作者：
GERAGHTY, KG
DONAGHEY, LF
机构：
[1] UNIV CALIF BERKELEY, LAWRENCE BERKELEY LAB, INORG MAT RES DIV, BERKELEY, CA 94720 USA
[2] UNIV CALIF BERKELEY, DEPT CHEM ENGN, BERKELEY, CA 94720 USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 08期
关键词：
D O I：
10.1149/1.2133036
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1201 / 1207
页数：7
相关论文
共 50 条
[41]   Simulation of Reactive Sputter Deposition of TiO2 Films [J].
Knizikevicius, Rimantas .
MATERIALS SCIENCE-MEDZIAGOTYRA, 2010, 16 (03) :202-204
[42]   REACTIVE MAGNETRON SPUTTERING OF TITANIUM AND ITS OXIDES [J].
NYAIESH, AR ;
HOLLAND, L .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (04) :1389-1392
[43]   Reactive sputter deposition and characterization of tantalum nitride thin films [J].
Radhakrishnan, K ;
Ing, NG ;
Gopalakrishnan, R .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1999, 57 (03) :224-227
[44]   Reactive sputter deposition of polycrystalline nitride and oxide superlattice coatings [J].
Northwestern Univ, Evanston, United States .
Surface and Coatings Technology, 1996, 86-87 (1 -3 pt 1) :170-176
[45]   Reactive DC sputter deposition and charactersation of AlN thin films [J].
Nyawo, T. G. ;
Ndwandwe, O. M. .
PROCEEDINGS OF SAIP2012: THE 57TH ANNUAL CONFERENCE OF THE SOUTH AFRICAN INSTITUTE OF PHYSICS, 2012, :180-185
[46]   Reactive Sputter Deposition of NiCrxOy Films Using NiCr Target [J].
Yu, He ;
Wang, Tao ;
Dong, Xiang ;
Jiang, Yadong ;
Wu, Roland .
MATERIALS SCIENCE-MEDZIAGOTYRA, 2016, 22 (02) :184-187
[47]   Reactive sputter deposition of WCx films for replacing hexavalent chromium [J].
Park, Y ;
Kang, S ;
Kim, D ;
Lee, C .
ECO-MATERIALS PROCESSING & DESIGN VI, 2005, 486-487 :514-517
[48]   REACTIVE MAGNETRON SPUTTER-DEPOSITION OF NIOBIUM NITRIDE FILMS [J].
WONG, MS ;
SPROUL, WD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04) :1528-1533
[49]   Formation of cubic boron nitride by the reactive sputter deposition of boron [J].
Jankowski, Alan F. ;
Hayes, Jeffrey P. ;
Makowiecki, Daniel M. ;
McKernan, Mark A. .
Thin Solid Films, 1997, 308-309 :94-100
[50]   HIGH-RATE REACTIVE SPUTTER DEPOSITION OF ZIRCONIUM DIOXIDE [J].
JONES, F .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (06) :3088-3097
12345