KINETICS OF REACTIVE SPUTTER DEPOSITION OF TITANIUM OXIDES

被引：20
作者：
GERAGHTY, KG
DONAGHEY, LF
机构：
[1] UNIV CALIF BERKELEY, LAWRENCE BERKELEY LAB, INORG MAT RES DIV, BERKELEY, CA 94720 USA
[2] UNIV CALIF BERKELEY, DEPT CHEM ENGN, BERKELEY, CA 94720 USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 08期
关键词：
D O I：
10.1149/1.2133036
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1201 / 1207
页数：7
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