KINETICS OF REACTIVE SPUTTER DEPOSITION OF TITANIUM OXIDES

被引：19
|
作者：
GERAGHTY, KG
DONAGHEY, LF
机构：
[1] UNIV CALIF BERKELEY, LAWRENCE BERKELEY LAB, INORG MAT RES DIV, BERKELEY, CA 94720 USA
[2] UNIV CALIF BERKELEY, DEPT CHEM ENGN, BERKELEY, CA 94720 USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 08期
关键词：
D O I：
10.1149/1.2133036
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1201 / 1207
页数：7
相关论文
共 50 条
  • [1] Reactive sputter deposition of titanium dioxide
    Dannenberg, R
    Greene, P
    THIN SOLID FILMS, 2000, 360 (1-2) : 122 - 127
  • [2] High rate reactive magnetron sputter deposition of titanium oxide
    Kubart, T.
    Depla, D.
    Martin, D. M.
    Nyberg, T.
    Berg, S.
    APPLIED PHYSICS LETTERS, 2008, 92 (22)
  • [3] SPUTTER-DEPOSITION - REACTIVE SPUTTER-DEPOSITION
    MATTOX, DM
    PLATING AND SURFACE FINISHING, 1993, 80 (10): : 60 - 61
  • [4] Ion beam reactive sputter-deposition of silicon and zirconium oxides
    Pringle, SD
    Valizadeh, R
    Colligon, JS
    Faunce, CA
    Kheyrandish, H
    ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING, 1996, 396 : 563 - 568
  • [5] Reactive sputter deposition
    Mattox, DM
    PLATING AND SURFACE FINISHING, 2001, 88 (01): : 74 - 77
  • [6] REACTIVE RADIOFREQUENCY SPUTTER DEPOSITION OF HIGHER NITRIDES OF TITANIUM, ZIRCONIUM, AND HAFNIUM
    YEE, DS
    CUOMO, JJ
    FRISCH, MA
    SMITH, DPE
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 381 - 387
  • [7] EFFECTS OF OXYGEN IN ION-BEAM SPUTTER DEPOSITION OF TITANIUM-OXIDES
    DEMIRYONT, H
    SITES, JR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (04): : 1457 - 1460
  • [8] Gas aggregation nanocluster source - Reactive sputter deposition of copper and titanium nanoclusters
    Marek, Ales
    Valter, Jan
    Kadlec, Stanislav
    Vyskocil, Jiri
    SURFACE & COATINGS TECHNOLOGY, 2011, 205 : S573 - S576
  • [9] NITROGEN, OXYGEN, AND ARGON INCORPORATION DURING REACTIVE SPUTTER DEPOSITION OF TITANIUM NITRIDE
    WILLIAMS, DS
    BAIOCCHI, FA
    BEAIRSTO, RC
    BROWN, JM
    KNOELL, RV
    MURARKA, SP
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (06): : 1723 - 1729
  • [10] Modeling reactive sputter deposition of titanium nitride in a triode magnetron sputtering system
    Sagas, J. C.
    Duarte, D. A.
    Irala, D. R.
    Fontana, L. C.
    Rosa, T. R.
    SURFACE & COATINGS TECHNOLOGY, 2011, 206 (07): : 1765 - 1770
12345