CHEMICAL-VAPOR-DEPOSITION OF TISI2 USING SIH4 AND TICL4

被引：12

作者：

MENDICINO, MA ^{[1
]}

SOUTHWELL, RP ^{[1
]}

SEEBAUER, EG ^{[1
]}

机构：

[1] UNIV ILLINOIS,DEPT CHEM ENGN,URBANA,IL 61801

来源：

THIN SOLID FILMS | 1994年 / 253卷 / 1-2期

关键词：

CHEMICAL VAPOR DEPOSITION; GROWTH MECHANISM; SILICIDES;

D O I：

10.1016/0040-6090(94)90369-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

An experimental approach for optimizing process parameters for TiSi2 chemical vapor deposition is described that combines measurements under ultrahigh vacuum conditions and at normal processing pressures. This approach has given an unprecedentedly detailed view of the chemical mechanisms underlying this deposition system.

引用

收藏

页码：473 / 478

页数：6

相关论文

共 17 条

[1] SELECTIVE RTLPCVD OF TISI2 WITHOUT SUBSTRATE CONSUMPTION [J].

BOUTEVILLE, A ;

ATTUYT, C ;

REMY, JC .

APPLIED SURFACE SCIENCE, 1991, 53 :11-17

[2] LPCVD OF TITANIUM DISILICIDE - SELECTIVITY OF GROWTH [J].

BOUTEVILLE, A ;

ROYER, A ;

REMY, JC .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8A) :2080-2083

[3] ANALYSIS OF THERMAL DESORPTION MASS-SPECTRA .1. [J].

CHAN, CM ;

ARIS, R ;

WEINBERG, WH .

APPLIED SURFACE SCIENCE, 1978, 1 (03) :360-376

[4] GRAIN-BOUNDARY DIFFUSION AND GROWTH OF TITANIUM SILICIDE LAYERS ON SILICON [J].

CORCORAN, YL ;

KING, AH ;

DELANEROLLE, N ;

KIM, B .

JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (11) :1177-1183

[5] METHOD FOR RECOATING PHOSPHOR ON COMMERCIAL LOW-ENERGY ELECTRON-DIFFRACTION OPTICS [J].

FLYNNSANDERS, DK ;

CHANG, SL ;

THIEL, PA ;

IMBIHL, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (02) :413-415

[6] OPTIMIZED DEPOSITION PARAMETERS FOR LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED TITANIUM SILICIDE [J].

ILDEREM, V ;

REIF, R .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (10) :2590-2596

[7]

KEMPER MJH, 1984, EL SOC EXT ABSTR, V842, P533

[8] SELECTIVE DEPOSITION OF TISI2 ON OXIDE PATTERNED WAFERS USING LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION [J].

LEE, J ;

REIF, R .

JOURNAL OF ELECTRONIC MATERIALS, 1991, 20 (04) :331-337

[9] LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF BOROPHOSPHOSILICATE GLASS-FILMS PRODUCED BY INJECTION OF MISCIBLE DADBS-TMB-TMP LIQUID SOURCES [J].

LEVY, RA ;

GALLAGHER, PK ;

SCHREY, F .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (07) :1744-1749

[10] A NEW LPCVD TECHNIQUE OF PRODUCING BOROPHOSPHOSILICATE GLASS-FILMS BY INJECTION OF MISCIBLE LIQUID PRECURSORS [J].

LEVY, RA ;

GALLAGHER, PK ;

SCHREY, F .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (02) :430-437