SRS-CE THIN-FILM ELECTROLUMINESCENT DEVICES FABRICATED BY POSTANNEALING TECHNIQUE AND THEIR ELECTRICAL-PROPERTIES

被引:17
作者
OKAMOTO, S
KUKI, T
SUZUKI, T
机构
[1] NHK Science and Technical Research Laboratories, Setagaya-ku, Tokyo, 157
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 04期
关键词
ELECTROLUMINESCENCE; ANNEAL; SRS; THIN FILM; INSULATOR; CE; FIELD EMISSION; TA2O5; SULFUR; CRACKING;
D O I
10.1143/JJAP.32.1672
中图分类号
O59 [应用物理学];
学科分类号
摘要
A postannealing technique has been used to make double-insulating SrS:Ce thin film electroluminescent (EL) devices. This technique has the effect of lowering the substrate temperature during SrS:Ce deposition, and also of improving the luminance and emission color with blueshift. Using this technique, the controllability of thin film processing and reproducibility of the devices have also been improved. A suitable annealing temperature is about 720-degrees-C. The device has a luminance of 320 cd/m2 and improved color coordinates, x=0.18 and y=0.35, using a 1-kHz drive frequency. The devices have also been evaluated as to EL properties and film crystallinity. In particular, a novel way of directly measuring the transient electric field across the active layer has been proposed.
引用
收藏
页码:1672 / 1680
页数:9
相关论文
共 11 条
  • [1] Barrow W. A., 1984, 1984 SID International Symposium. Digest of Technical Papers, P249
  • [2] LEPPANEN M, 1991, 1991 SID INT S AAN C, P282
  • [3] NIRE T, 1989, 4TH P INT WORKSH EL, P218
  • [4] OHNISHI H, 1990, P SOC INF DISP, V31, P31
  • [5] OKAMOTO S, 1990, 5TH P INT WORKSH EL, P203
  • [6] ONIZAWA K, 1988, J ELECTROCHEM SOC, V135, P2631
  • [7] SEEGER K, 1988, SEMICONDUCTOR PHYSIC, P270
  • [8] SIMMONS JG, 1970, HDB THIN FILM TECHNO
  • [9] Sze S. M., 1981, PHYS SEMICONDUCTOR D, V2nd, P96
  • [10] Tanaka S., 1985, 1985 SID International Symposium. Digest of Technical Papers, P218