A STUDY OF DEFECTS IN AMORPHOUS-SILICON FILMS

被引：52
作者：
DANNEFAER, S [1 ]
KERR, D [1 ]
HOGG, BG [1 ]
机构：
[1] AARHUS UNIV,INST PHYS,DK-8000 AARHUS C,DENMARK
来源：
JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 01期
关键词：
D O I：
10.1063/1.331724
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：155 / 160
页数：6
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