DIRECT ION-BEAM DEPOSITION FOR THIN-FILM FORMATION

被引:14
作者
AMANO, J
机构
关键词
D O I
10.1016/0040-6090(82)90193-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:115 / 122
页数:8
相关论文
共 15 条
[1]  
AMANO J, 1977, J VAC SCI TECHNOL, V14, P695, DOI 10.1116/1.569185
[2]   THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .2. PB+ ION-BEAM DEPOSITION AND ANALYSIS OF DEPOSITS [J].
AMANO, J ;
LAWSON, RPW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (02) :690-694
[3]   THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .1. SYSTEM SPECIFICATION AND DESIGN [J].
AMANO, J ;
BRYCE, P ;
LAWSON, RPW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (02) :591-595
[4]  
AMANO J, 1978, J VAC SCI TECHNOL, V15, P113
[5]  
Chu WK., 1978, BACKSCATTERING SPECT
[6]  
Maissel L.I., 1970, HDB THIN FILM TECHNO
[7]  
MATTOX DM, 1973, SPUTTER DEPOSITION I
[8]   HIGH INTENSITY LOW ENERGY SPREAD ION SOURCE FOR CHEMICAL ACCELERATORS [J].
MENZINGER, M ;
WAHLIN, L .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (01) :102-+
[9]  
OHMAE N, 1977, 7TH P INT VAC C 3RD, P1607
[10]  
THOMAS GE, 1977, 3RD P INT C SURF CHE, P136