SYNTHESIS AND EVALUATION OF METHYL-METHACRYLATE COPOLYMERS AND TERPOLYMERS AS ELECTRON-BEAM RESISTS .1. POLY(METHYL METHACRYLATE-METHACRYLIC ACID-METHACRYLOYL CHLORIDE)

被引：2

作者：

GITSOV, I ^{[1
]}

MADJAROVA, NA ^{[1
]}

机构：

[1] INST MICROELECTR,BU-1184 SOFIA,BULGARIA

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 1990年 / 41卷 / 11-12期

关键词：

D O I：

10.1002/app.1990.070411117

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Terpolymers of methyl methacrylate with methacrylic acid and methacryloyl chloride [poly(MMA‐MAA‐MAC)] were synthesized with high yields by slow radical polymerization. The influence of the temperature of prebaking on the changes in the chemical composition and the molecular weight characteristics of poly(MMA‐5%MAA‐5%MAC) was studied by infrared spectroscopy and gel permeation chromatography. It was found that resists containing terpolymer with molecular weight (M̄w) of 41,000, which were prebaked at 100°C, were able to produce high contrast images (γ = 3.3) at doses of 16 μC/cm2. Copyright © 1990 John Wiley & Sons, Inc.

引用

页码：2705 / 2710

页数：6

共 10 条

[1]

Bowden M. J., 1975, J POLYM SCI POLYM S, V49, P221

[2] COPOLYMERS OF METHYL-METHACRYLATE AND METHACRYLIC-ACID AND THEIR METAL-SALTS AS RADIATION SENSITIVE RESISTS [J].