共 8 条
[1]
APPLICATION OF LOW-ANGLE RUTHERFORD BACKSCATTERING AND CHANNELING TECHNIQUES TO DETERMINE IMPLANTATION INDUCED DISORDER PROFILE DISTRIBUTIONS IN SEMICONDUCTORS
[J].
NUCLEAR INSTRUMENTS & METHODS,
1980, 168 (1-3)
:283-288
[2]
FLUX, FLUENCE AND IMPLANTATION TEMPERATURE-DEPENDENCE OF DISORDER PRODUCED BY 40 KEV N+ ION IRRADIATION OF GAAS
[J].
RADIATION EFFECTS AND DEFECTS IN SOLIDS,
1980, 52 (3-4)
:211-224
[3]
DAVIES JA, 1982, FIZIKA TECHNICA POLU, V16, P577
[5]
SLATER M, 1984, UNPUB RAD EFFECTS
[6]
DISORDER PRODUCTION IN ION-IMPLANTED GALLIUM-ARSENIDE AT 40-K
[J].
RADIATION EFFECTS AND DEFECTS IN SOLIDS,
1983, 71 (1-2)
:95-107
[7]
DISORDER DEPENDENCE OF ION-IMPLANTED GAAS ON THE TYPE OF ION
[J].
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH,
1982, 203 (1-3)
:523-526
[8]
ANNEALING STUDIES OF ION-IMPLANTED GAAS IN THE 40-300-K RANGE
[J].
RADIATION EFFECTS AND DEFECTS IN SOLIDS,
1982, 66 (1-2)
:15-20