THE INFLUENCE OF DOSE-RATE AND ANALYSIS PROCEDURES ON MEASURED DAMAGE IN P+ ION-IMPLANTED GAAS

被引:16
作者
CARTER, G [1 ]
NOBES, MJ [1 ]
TASHLYKOV, IS [1 ]
机构
[1] UNIV SALFORD,THIN FILM & SURFACE RES CTR,SALFORD M5 4WT,LANCS,ENGLAND
来源
RADIATION EFFECTS LETTERS | 1984年 / 85卷 / 01期
关键词
D O I
10.1080/01422448408209676
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
引用
收藏
页码:37 / 43
页数:7
相关论文
共 8 条
[1]   APPLICATION OF LOW-ANGLE RUTHERFORD BACKSCATTERING AND CHANNELING TECHNIQUES TO DETERMINE IMPLANTATION INDUCED DISORDER PROFILE DISTRIBUTIONS IN SEMICONDUCTORS [J].
AHMED, NAG ;
CHRISTODOULIDES, CE ;
CARTER, G ;
NOBES, MJ ;
TITOV, AI .
NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3) :283-288
[2]   FLUX, FLUENCE AND IMPLANTATION TEMPERATURE-DEPENDENCE OF DISORDER PRODUCED BY 40 KEV N+ ION IRRADIATION OF GAAS [J].
AHMED, NAG ;
CHRISTODOULIDES, CE ;
CARTER, G .
RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1980, 52 (3-4) :211-224
[3]  
DAVIES JA, 1982, FIZIKA TECHNICA POLU, V16, P577
[4]   DAMAGE AND REORDERING OF ION-IMPLANTED LAYERS OF INP [J].
KENNEDY, EF .
APPLIED PHYSICS LETTERS, 1981, 38 (05) :375-377
[5]  
SLATER M, 1984, UNPUB RAD EFFECTS
[6]   DISORDER PRODUCTION IN ION-IMPLANTED GALLIUM-ARSENIDE AT 40-K [J].
STEVANOVIC, DV ;
TOGNETTI, NP ;
CARTER, G ;
CHRISTODOULIDES, CE ;
IBRAHIM, AM ;
THOMPSON, DA .
RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1983, 71 (1-2) :95-107
[7]   DISORDER DEPENDENCE OF ION-IMPLANTED GAAS ON THE TYPE OF ION [J].
TASHLYKOV, IS .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1982, 203 (1-3) :523-526
[8]   ANNEALING STUDIES OF ION-IMPLANTED GAAS IN THE 40-300-K RANGE [J].
TOGNETTI, NP ;
CARTER, G ;
STEVANOVIC, DV ;
THOMPSON, DA .
RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1982, 66 (1-2) :15-20