NITROCELLULOSE AS A SELF-DEVELOPING RESIST WITH SUBMICROMETER RESOLUTION AND PROCESSING STABILITY

被引：41
作者：
GEIS, MW
RANDALL, JN
DEUTSCH, TF
EFREMOW, NN
DONNELLY, JP
WOODHOUSE, JD
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期
关键词：
D O I：
10.1116/1.582756
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：1178 / 1181
页数：4
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