THEORETICAL-STUDIES OF SURFACE PROCESSES IN SILICON CHEMICAL VAPOR-DEPOSITION

被引：0

作者：

RAFF, LM ^{[1
]}

THOMPSON, DL ^{[1
]}

机构：

[1] OKLAHOMA STATE UNIV,DEPT CHEM,STILLWATER,OK 74078

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1986年 / 191卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：23 / COLL

共 50 条

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