INSITU SCANNING TUNNELING MICROSCOPY AT POTENTIAL CONTROLLED AG(100) SUBSTRATES

被引：80

作者：

CHRISTOPH, R ^{[1
]}

SIEGENTHALER, H ^{[1
]}

ROHRER, H ^{[1
]}

WIESE, H ^{[1
]}

机构：

[1] ZURICH RES LAB,IBM RES DIV,CH-8803 RUSCHLIKON,SWITZERLAND

来源：

ELECTROCHIMICA ACTA | 1989年 / 34卷 / 08期

关键词：

D O I：

10.1016/0013-4686(89)87134-8

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1011 / 1022

页数：12

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