MODELING OF CHEMICAL-REACTIONS UNDER NONEQUILIBRIUM HALOGENATED ELECTRICAL-DISCHARGE CONDITIONS

被引：6

作者：

SLOVETSKY, DI

机构：

[1] Institute of Petrochemical Syntheses, Academy of Sciences, 117071, Moscow

来源：

PURE AND APPLIED CHEMISTRY | 1990年 / 62卷 / 09期

关键词：

D O I：

10.1351/pac199062091729

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Statement of the problem and results are discussed concerning modelling of the chemical reactions under nonequilibrium electric discharge plasma conditions in SF6, CF4, CCl4 and SP6+02 mixtures. As the base for modelling the inner plasma parameters as measured are used in line with the quantitative study of chemical reaction kinetics including reactions with participation of the halogen atoms and halogenated radicals and molecules. © 1990 IUPAC

引用

页码：1729 / 1742

页数：14

共 27 条

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[12]

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[13]

NEVSOROV PI, 1987, PLASMA CHEM, V87, P37

[14] A MODEL OF THE CHEMICAL PROCESSES OCCURRING IN CF-4/O2 DISCHARGES USED IN PLASMA-ETCHING [J].