质子入射AlxGa1–xN材料的位移损伤模拟

被引:1
|
作者
何欢 [1 ]
白雨蓉 [1 ]
田赏 [2 ]
刘方 [1 ]
臧航 [1 ]
柳文波 [1 ]
李培 [1 ]
贺朝会 [1 ]
机构
[1] 西安交通大学核科学与技术学院
[2] 北京大学物理学院
关键词
AlxGa1–xN; 质子; 位移损伤; 两体碰撞近似;
D O I
暂无
中图分类号
TQ133.51 [];
学科分类号
摘要
氮化镓材料由于优良的电学特性以及耐辐照性能,其与不同含量AlxGa1–xN材料组成的电子器件,有望应用于未来空间电子系统中.然而目前关于氮化镓位移损伤机理研究多关注于氮化镓材料,对于AlxGa1–xN材料位移损伤研究较少.本文通过两体碰撞近似理论模拟了10 keV—300 MeV质子在不同Al元素含量的AlxGa1–xN材料中的位移损伤机理.结果表明质子在AlxGa1–xN材料中产生的非电离能损随质子能量增大而下降,当质子能量低于40 MeV时,非电离能损随着Al含量的增大而变大,当质子能量升高时该趋势相反;分析由质子导致的初级撞出原子以及非电离能量沉积,发现不同AlxGa1–xN材料初级撞出原子能谱虽然相似,然而Al元素含量越高,由弹性碰撞产生的自身初级撞出原子比例越高;对于质子在不同深度造成的非电离能量沉积,弹性碰撞导致的能量沉积在径迹末端最大,而非弹性碰撞导致的能量沉积在径迹前端均匀分布,径迹末端减小,并且低能质子主要是通过弹性碰撞造成非电离能量沉积,而高能质子恰好相反.本研究揭示了不同Al元素含量的AlxGa1–xN材料质子位移损伤机理,为GaN器件在空间辐射环境下的应用提供参考依据.
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页码:98 / 105
页数:8
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