Colorimetric determination of uric acid based on the suppression of oxidative etching of silver nanoparticles by chloroauric acid

被引：0
作者：
Li Li
Junli Wang
Zhengbo Chen
机构：
[1] Xinxiang University,College of Chemistry and Chemical Engineering
[2] Capital Normal University,Department of Chemistry
来源：
Microchimica Acta | 2020年 / 187卷
关键词：
Colorimetric assay; Uric acid; Oxidation etching; Silver nanoparticles; Chloroauric acid; Redox reaction; Color change;
D O I：
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摘要：
A colorimetric method is described for the determination of uric acid (UA). The assay is based on oxidative etching of silver nanoparticles (AgNPs) by chloroauric acid (HAuCl4). The presence of UA suppresses the redox reaction between AgNPs and HAuCl4 because a competitive reaction occurs between HAuCl4 and UA. This results in a color change of the solution from brown to yellow. In parallel, the absorbance is blue shifted from 477 to 428 nm. The method has a detection limit as low as 30 pM (at S/N = 3) and a linear response range that covers the 0.1 nM to 0.1 mM UA concentration range. The reliability of the method was successfully demonstrated by analyzing spiked serum samples.
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