Effect of doping on the crystallization kinetics of phase change memory materials on the basis of Ge–Sb–Te system

被引:0
作者
Alexey Babich
Alexey Sherchenkov
Sergey Kozyukhin
Petr Lazarenko
Olga Boytsova
Alexey Shuliatyev
机构
[1] National Research University of Electronic Technology,Department of Chemistry
[2] Kurnakov Institute of General and Inorganic Chemistry of the Russian Academy of Sciences,undefined
[3] National Research Tomsk State University,undefined
来源
Journal of Thermal Analysis and Calorimetry | 2017年 / 127卷
关键词
Kinetic parameters; DSC; Phase change memory; Chalcogenide alloys; Doping;
D O I
暂无
中图分类号
学科分类号
摘要
The influence of different amounts of Bi, Ti and In on the thermal properties and crystallization kinetics of Ge2Sb2Te5 thin films for phase change memory devices was investigated. Temperatures and heat effects of crystallization were evaluated for all investigated compositions. Joint utilization of model-free Ozawa–Flynn–Wall and model-fitting Coates-Redfern methods allowed to estimate effective activation energies and pre-exponential factors for crystallization processes of amorphous films as functions of conversion, and determine reaction models. It was found that crystallization process most adequately can be described by the second- or third-order reaction. Storage and data processing times of the phase change memory cells on the basis of investigated materials were calculated with using of determined kinetic triplets of crystallization processes. Calculations showed that crystallization time decreases nearly on the order of magnitude for Ge2Sb2Te5+1 mass% In in comparison with undoped Ge2Sb2Te5. On the other hand, compositions with 0.5 and 3 mass% In allow to increase sufficiently storage time. Introduction of Ti does not significantly affect data processing time of phase change memory cell; however, it decreases storage time. Ge2Sb2Te5+0.5 mass% Bi composition have the most suitable kinetic parameters for phase change memory among the studied thin films.
引用
收藏
页码:283 / 290
页数:7
相关论文
共 55 条
  • [1] Raoux S(2010)Phase change materials and their application to nonvolatile memories Chem Rev 110 240-689
  • [2] Wełnic W(2010)Phase change memory technology J Vac Sci Technol B 28 223-undefined
  • [3] Ielmini D(1987)High speed overwritable phase change optical disk material J Appl Phys 26 61-undefined
  • [4] Burr GW(2014)Estimation of kinetic parameters for the phase change memory materials by DSC measurements J Therm Anal Calorim 117 1509-undefined
  • [5] Breitwisch MJ(2014)Influence of doping on the crystallization kinetics of Ge–Sb–Te thin films for phase-change memory application Proc SPIE 9440 944005-1-undefined
  • [6] Franceschini M(2008)Phase-change random access memory: a scalable technology IBM J Res Dev 52 465-undefined
  • [7] Garetto D(1965)Sb Izv. Akad Nauk SSSR Neorg Mater 1 204-undefined
  • [8] Gopalakrishnan K(2010)Te Phys Status Solidi (C) 7 848-undefined
  • [9] Jackson B(2014)–GeTe phase diagram Can J Phys 92 684-undefined
  • [10] Kurdi B(1993)Thermal effects in Ge-Sb-Te PCM materials during multiple thermal cycling Jpn J Appl Phys 32 775-undefined