Influence of cathode roughness on discharge homogeneity of a high-pulse repetition frequency long-pulse XeCl laser

被引：0
|
作者：
O. Uteza
P. Delaporte
B. Fontaine
B. Forestier
M. Sentis
I. Tassy
机构：
[1] Institut de Recherche sur les Phénomènes Hors Equilibre,
[2] U.M.R. 6594 C.N.R.S.,undefined
[3] Aix-Marseille Universities I & II,undefined
[4] Case 918,undefined
[5] 163,undefined
[6] Av. de Luminy,undefined
[7] 13288 Marseille Cedex 9,undefined
[8] France (Fax: +33-491/829-289,undefined
[9] E-mail: olivier.uteza@irphe-lp3.univ-mrs.fr),undefined
来源：
Applied Physics B | 1998年 / 67卷
关键词：
PACS: 42.55.Lt; 52.80.-s;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
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页码：185 / 191
页数：6
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