Fundamental aspects of film formation in electrochemical polishing of silver and silver-copper alloys in thiosulfate solutions

被引:0
作者
E. P. Grishina
S. I. Galanin
O. A. Ivanova
机构
[1] Russian Academy of Sciences,Institute of Chemistry of Solutions
[2] Kostroma State Technological University,undefined
来源
Russian Journal of Applied Chemistry | 2004年 / 77卷
关键词
Copper; Cycling Voltammetry; Thiosulfate; Film Formation; Fundamental Aspect;
D O I
暂无
中图分类号
学科分类号
摘要
The anodic behavior of silver and its alloys with copper in thiosulfate solutions was studied by cycling voltammetry. A scheme of an electrochemical polishing process including the stage of formation of a resistive layer of silver thiosulfate and the chemical stage of its dissolution is suggested.
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页码:1283 / 1286
页数:3
相关论文
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