Refractive index variation of amorphous Ta2O5 film fabricated by ion beam sputtering with RF bias power

被引：0

作者：

Chen Yang Huang

Hao Min Ku

Yi Ping Tsai

Wei Kai Chen

Shiuh Chao

机构：

[1] National Tsing Hua University,Institute of Photonics Technologies

[2] Industrial Technology Research Institute,undefined

来源：

Optical Review | 2009年 / 16卷

关键词：

tantalum pentoxide; ion beam sputtering; RF bias power; refractive index;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Ta2O5 film was fabricated by ion beam sputtering with RF bias applied to the substrate. The refractive index in the visible range of the film can be controlled to vary linearly with the RF bias power while low absorption is maintained.

引用

页码：274 / 275

页数：1

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