Period-doubling reconstructions of semiconductor partial dislocations

被引:0
作者
Ji-Sang Park
Bing Huang
Su-Huai Wei
Joongoo Kang
William E McMahon
机构
[1] National Renewable Energy Laboratory,Department of Emerging Materials Science
[2] Oak Ridge National Laboratory,undefined
[3] DGIST,undefined
来源
NPG Asia Materials | 2015年 / 7卷
关键词
D O I
暂无
中图分类号
学科分类号
摘要
Atomic-scale understanding and control of dislocation cores is of great technological importance, because they act as recombination centers for charge carriers in optoelectronic devices. Using hybrid density-functional calculations, we present period-doubling reconstructions of a 90° partial dislocation in GaAs, for which the periodicity of like-atom dimers along the dislocation line varies from one to two, to four dimers. The electronic properties of a dislocation change drastically with each period doubling. The dimers in the single-period dislocation are able to interact, to form a dispersive one-dimensional band with deep-gap states. However, the inter-dimer interaction for the double-period dislocation becomes significantly reduced; hence, it is free of mid-gap states. The Ga core undergoes a further period-doubling transition to a quadruple-period reconstruction induced by the formation of small hole polarons. The competition between these dislocation phases suggests a new passivation strategy via population manipulation of the detrimental single-period phase.
引用
收藏
页码:e216 / e216
相关论文
共 165 条
  • [1] Dimroth F(2014)Wafer bonded four-junction GaInP/GaAs//GaInAsP/GaInAs concentrator solar cells with 44.7% efficiency Prog. Photovolt Res. Appl. 22 277-282
  • [2] Grave M(2015)Quadruple-junction inverted metamorphic concentrator devices IEEE J. Photovolt 5 432-437
  • [3] Beutel P(2010)Progress and challenges for next-generation high-efficiency multijunction solar cells Curr. Opin. Solid State Mater. Sci. 14 131-138
  • [4] Fiedeler U(1974)Photoluminescence at dislocations in GaAs Phys. Rev. Lett. 33 1082-1084
  • [5] Karcher C(1993)Changes in electrical device characteristics during the Appl. Phys. Lett. 62 1426-1428
  • [6] Tibbits TND(2001) formation of dislocations Appl. Phys. Lett. 78 541-543
  • [7] Oliva E(1992)Correlation between leakage current density and threading dislocation density in SiGe J. Vac. Sci. Technol. B 10 1807-1819
  • [8] Siefer G(1996) diodes grown on relaxed graded buffer layers Adv. Phys. 45 87-146
  • [9] Schachtner M(2014)Relaxed Ge IEEE J. Photovoltaic. 4 190-195
  • [10] Wekkeli A(1993)Si Appl. Phys. Lett. 62 1417-1419