Structural and mechanical properties of CVD deposited titanium aluminium nitride (TiAlN) thin films

被引：0

作者：

Soham Das

Spandan Guha

Ranjan Ghadai

Dhruva Kumar

Bibhu P. Swain

机构：

[1] Sikkim Manipal Institute of Technology,Department of Mechanical Engineering

[2] Sikkim Manipal Institute of Technology,Nano

来源：

Applied Physics A | 2017年 / 123卷

关键词：

Plasticity Index; Phonon Band; TiAlN Coating; Transverse Optic; Transverse Acoustic;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Titanium aluminium nitride (TiAlN) thin films were deposited by chemical vapour deposition using TiO2 powder, Al powder and N2 gas. The morphology and mechanical properties of the films were characterized by scanning electron microscopy and nanoindentation technique, respectively. The structural properties were characterized by Raman spectroscopy and X-ray diffraction. The XRD result shows TiAlN films are of NaCl-type metal nitride structure. Micro-Raman peaks of the TiAlN thin film were observed within 450 and 642 cm−1 for acoustic and optic range, respectively. A maximum hardness and Young modulus up to 22 and 272.15 GPa, respectively, were observed in the TiAlN film deposited at 1200 °C.

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