Fast deposition of diamond-like and diamond films using a plasmatron with interelectrode inserts

被引：0
|
作者：
D. L. Tsyganov
A. I. Veremeichik
M. I. Sazonov
机构：
[1] Instituto Superior Tecnico,Instituto de Plasmas de Fusao Nuclear, Laboratorio Associado
[2] Brest State Technical University,undefined
来源：
Instruments and Experimental Techniques | 2015年 / 58卷
关键词：
Diamond Film; Chemical Vapor Deposition Method; Graphite Phase; Fast Deposition; Auger Electron Spectros;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Data on the deposition of thin wear-resistant diamond-like films (DLFs) and diamond films (DFs) are reported. Films are deposited using the chemical vapor deposition method with the application of a supersonic high-temperature plasma jet generated by a high-enthalpy plasmatron with a sectionalized interelectrode insert and a cold gas curtain of discharge chamber walls. The deposition rate for DLFs and DFs is as high as 30–50 μm/h. The best results (the absence of the graphite phase in a film) are obtained at the highest degree of ionization of the supersonic plasma jet.
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页码：297 / 301
页数：4
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