Growth of the dilute magnetic semiconductor GaMnN by molecular-beam epitaxy

被引:0
|
作者
M. E. Overberg
G. T. Thaler
C. R. Abernathy
N. A. Theodoropoulou
K. T. McCarthy
S. B. Arnason
J. S. Lee
J. D. Lim
S. B. Shim
K. S. Suh
Z. G. Khim
Y. D. Park
S. J. Pearton
A. F. Hebard
机构
[1] University of Florida,Department of Materials Science and Engineering
[2] University of Florida,Department of Physics
[3] Seoul National University,Center for Strongly Correlated Materials Research
来源
Journal of Electronic Materials | 2003年 / 32卷
关键词
GaMnN; MBE; ferromagnetic; dilute magnetic semiconductor; molecular beam epitaxy; MOCVD;
D O I
暂无
中图分类号
学科分类号
摘要
Growth by molecular-beam epitaxy (MBE) of the dilute-magnetic alloy GaMnN is reported. The Mn concentration, as determined by Auger electron spectroscopy (AES), is found to be linear with increasing Mn-cell temperature up to ∼43at.%Mn. No second phases are observed for Mn levels below 9 at.%. The cubic-phase Mn4N is found to be the thermodynamically stable phase at the growth conditions used to produce GaMnN. Hysteresis in M versus H is observed in both GaMnN and GaMnN:C grown on both sapphire and metal-oxide chemical-vapor deposition (MOCVD) GaN at several growth temperatures. Magnetotransport results show the anomalous Hall effect, negative magnetoresistance, and magnetic hysteresis, indicating that Mn is incorporating into the GaN and forming the ferromagnetic-semiconductor GaMNN. Room-temperature hysteresis is obtained in magnetization measurements with an optimum Mn concentration of ∼3 at.%.
引用
收藏
页码:298 / 306
页数:8
相关论文
共 50 条
  • [41] Epitaxial growth of HgCdTe 1.55 μm avalanche photodiodes by molecular-beam epitaxy
    de Lyon, TJ
    Baumgratz, B
    Chapman, G
    Gordon, E
    Hunter, AT
    Jack, M
    Jensen, JE
    Johnson, W
    Johs, B
    Kosai, K
    Larsen, W
    Olson, GL
    Sen, M
    Walker, B
    PHOTODETECTORS: MATERIALS AND DEVICES IV, 1999, 3629 : 256 - 267
  • [42] Growth and characterization of isotopic natGa15N by molecular-beam epitaxy
    Yao, Yong-zhao
    Ohgaki, Takeshi
    Matsumoto, Kenji
    Sakaguchi, Isao
    Wada, Yoshiki
    Haneda, Hajime
    Sekiguchi, Takashi
    Ohashi, Naoki
    GALLIUM NITRIDE MATERIALS AND DEVICES IV, 2009, 7216
  • [43] Distinct growth behaviours in molecular-beam epitaxy of (In,Ga)As on GaAs(311)A substrate
    Gong, Q
    Nötzel, R
    Wolter, JH
    Schönherr, HP
    Ploog, KH
    JOURNAL OF CRYSTAL GROWTH, 2002, 242 (1-2) : 104 - 108
  • [44] Growth behavior of Dy/Cr multilayers during molecular-beam epitaxy and their structures
    Kamada, Yasuhiro
    Tanino, Hitoshi
    Kingetsu, Toshiki
    Yamamoto, Masahiko
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (12): : 9194 - 9196
  • [45] Growth of ZnO and ZnMgO nanowires by Au-catalysed molecular-beam epitaxy
    Isakov, Ivan
    Panfilova, Marina
    Sourribes, Marion J. L.
    Warburton, Paul A.
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 10, NO 10, 2013, 10 (10): : 1308 - 1313
  • [46] INITIAL-STAGES OF GAAS MOLECULAR-BEAM EPITAXY GROWTH ON POROUS SI
    MAEHASHI, K
    SATO, M
    HASEGAWA, S
    NAKASHIMA, H
    ITO, T
    HIRAKI, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1991, 30 (4B): : L683 - L685
  • [47] Comparison of organic thin films deposited by supersonic molecular-beam epitaxy and organic molecular-beam epitaxy: The case of titanyl phthalocyanine
    Walzer, K
    Toccoli, T
    Pallaoro, A
    Iannotta, S
    Wagner, C
    Fritz, T
    Leo, K
    SURFACE SCIENCE, 2006, 600 (10) : 2064 - 2069
  • [48] MnAs growth in molecular beam epitaxy and its magnetic properties
    Kim, KH
    Park, JH
    Lee, KJ
    Park, JB
    Kim, D
    Kim, H
    Ihm, YE
    Kim, CS
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2003, 42 : S395 - S398
  • [49] MOLECULAR-BEAM EPITAXY OF II-VI WIDE BANDGAP SEMICONDUCTORS
    GAINES, JM
    PHILIPS JOURNAL OF RESEARCH, 1995, 49 (03) : 245 - 265
  • [50] Molecular-beam epitaxy of ultrathin Si films on sapphire
    Shilyaev, P. A.
    Pavlov, D. A.
    Korotkov, E. V.
    Treushnikov, M. V.
    MICRO- AND NANOELECTRONICS 2007, 2008, 7025