Growth of the dilute magnetic semiconductor GaMnN by molecular-beam epitaxy

被引:0
|
作者
M. E. Overberg
G. T. Thaler
C. R. Abernathy
N. A. Theodoropoulou
K. T. McCarthy
S. B. Arnason
J. S. Lee
J. D. Lim
S. B. Shim
K. S. Suh
Z. G. Khim
Y. D. Park
S. J. Pearton
A. F. Hebard
机构
[1] University of Florida,Department of Materials Science and Engineering
[2] University of Florida,Department of Physics
[3] Seoul National University,Center for Strongly Correlated Materials Research
来源
Journal of Electronic Materials | 2003年 / 32卷
关键词
GaMnN; MBE; ferromagnetic; dilute magnetic semiconductor; molecular beam epitaxy; MOCVD;
D O I
暂无
中图分类号
学科分类号
摘要
Growth by molecular-beam epitaxy (MBE) of the dilute-magnetic alloy GaMnN is reported. The Mn concentration, as determined by Auger electron spectroscopy (AES), is found to be linear with increasing Mn-cell temperature up to ∼43at.%Mn. No second phases are observed for Mn levels below 9 at.%. The cubic-phase Mn4N is found to be the thermodynamically stable phase at the growth conditions used to produce GaMnN. Hysteresis in M versus H is observed in both GaMnN and GaMnN:C grown on both sapphire and metal-oxide chemical-vapor deposition (MOCVD) GaN at several growth temperatures. Magnetotransport results show the anomalous Hall effect, negative magnetoresistance, and magnetic hysteresis, indicating that Mn is incorporating into the GaN and forming the ferromagnetic-semiconductor GaMNN. Room-temperature hysteresis is obtained in magnetization measurements with an optimum Mn concentration of ∼3 at.%.
引用
收藏
页码:298 / 306
页数:8
相关论文
共 50 条
  • [1] Growth of the dilute magnetic semiconductor GaMnN by molecular-beam epitaxy
    Overberg, ME
    Thaler, GT
    Abernathy, CR
    Theodoropoulou, NA
    McCarthy, KT
    Arnason, SB
    Lee, JS
    Lim, JD
    Shim, SB
    Suh, KS
    Khim, ZG
    Park, YD
    Pearton, SJ
    Hebard, AF
    JOURNAL OF ELECTRONIC MATERIALS, 2003, 32 (05) : 298 - 306
  • [2] Magnetic and optical properties of GaMnN grown by ammonia-source molecular-beam epitaxy
    Hashimoto, M
    Zhou, YK
    Tampo, H
    Kanamura, M
    Asahi, H
    JOURNAL OF CRYSTAL GROWTH, 2003, 252 (04) : 499 - 504
  • [3] COMPOUND SEMICONDUCTOR GROWTH BY METALLORGANIC MOLECULAR-BEAM EPITAXY (MOMBE)
    ABERNATHY, CR
    MATERIALS SCIENCE & ENGINEERING R-REPORTS, 1995, 14 (05): : 203 - 253
  • [4] Molecular-beam epitaxy growth of dilute GaAsN alloys by surface nitridation
    Urakami, Noriyuki
    Yamane, Keisuke
    Sekiguchi, Hiroto
    Okada, Hiroshi
    Wakahara, Akihiro
    JOURNAL OF CRYSTAL GROWTH, 2016, 435 : 19 - 23
  • [5] Growth of CrTe thin films by molecular-beam epitaxy
    Sreenivasan, MG
    Hou, XJ
    Teo, KL
    Jalil, MBA
    Liew, T
    Chong, TC
    THIN SOLID FILMS, 2006, 505 (1-2) : 133 - 136
  • [6] MECHANISMS OF LAYER GROWTH DURING MOLECULAR-BEAM EPITAXY OF SEMICONDUCTOR-FILMS
    JOYCE, BA
    SHITARA, T
    FAHY, MR
    SATO, K
    NEAVE, JH
    FAWCETT, PN
    KAMIYA, I
    ZHANG, XM
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1995, 30 (2-3): : 87 - 97
  • [7] SELECTIVE GROWTH OF GAAS BY MOLECULAR-BEAM EPITAXY
    SUGAYA, T
    OKADA, Y
    KAWABE, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1992, 31 (6A): : L713 - L716
  • [8] Deposition and growth with desorption in molecular-beam epitaxy
    Pimpinelli, A
    Peyla, P
    JOURNAL OF CRYSTAL GROWTH, 1998, 183 (03) : 311 - 322
  • [9] Growth of dilute BGaP alloys by molecular beam epitaxy
    Urakami, N.
    Fukami, F.
    Sekiguchi, H.
    Okada, H.
    Wakahara, A.
    JOURNAL OF CRYSTAL GROWTH, 2013, 378 : 96 - 99
  • [10] Relevant characteristics of undoped GaMnN grown by using molecular beam epitaxy
    Lee, J. W.
    Shon, Yoon
    Subramaniam, N. G.
    Park, C. S.
    Kim, E. K.
    Im, Hyunsik
    Kim, H. S.
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2015, 67 (03) : 541 - 546