Features of surface structuring of silicon (100) crystals by microwave plasma treatment in different gas environments

被引：0
作者：
V. Ya. Shanygin
R. K. Yafarov
机构：
[1] Russian Academy of Sciences,Kotel’nikov Institute of Radio Engineering and Electronics, Saratov Branch
来源：
Technical Physics Letters | 2013年 / 39卷
关键词：
Plasma Treatment; Technical Physic Letter; Electron Cyclotron Resonance; Height Variation; Microwave Plasma;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The laws of the effect of microwave plasma treatment modes on the surface nanomorphology of silicon single crystals with crystallographic orientation (100) with a natural oxide coating are studied. Model mechanisms of surface nanostructuring during plasma treatment in gas environments with different selectivities for the heterostructure material of the substrate are discussed.
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页码：405 / 408
页数：3
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